Study of the effects of the geometry on the performance of vertically coupled InP microdisk resonators

Author

Djordjev, Kostadin ; Choi, Seung-June ; Choi, Sang-Jun ; Dapkus, P.D.

Author_Institution

Dept. of Electr. Eng., Univ. of Southern California, Los Angeles, CA, USA

Volume

20

Issue

8

fYear

2002

fDate

8/1/2002 12:00:00 AM

Firstpage

1485

Lastpage

1492

Abstract

High-quality-factor vertically coupled InP microdisk resonators have been fabricated. The devices exhibit smooth sidewalls, single-mode operation, high-quality factors Q in excess of 7000, and finesse of 50. The influence of different structural parameters on the device performance is investigated both theoretically and experimentally. These include the disk radius R, the coupling separation d_c, the thickness of the thin membrane between the waveguides and resonator that remains after fabrication t, and the waveguide etch depth d_WG (defined as the distance between the core layer of the waveguides and the thin membrane).

Keywords

III-V semiconductors; Q-factor; cavity resonators; indium compounds; integrated optics; micro-optics; optical losses; optical resonators; optical waveguide filters; InP; coupling separation; disk radius; distributed loss; finesse; geometry effects; high quality factor; integrated optics; localized loss; membrane thickness; microdisk resonant cavity; optical waveguide filters; single-mode operation; smooth sidewalls; structural parameters; vertically coupled InP microdisk resonators; waveguide etch depth; Biomembranes; Etching; Geometry; Indium phosphide; Optical device fabrication; Optical filters; Optical resonators; Optical waveguide theory; Optical waveguides; Resonator filters;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/JLT.2002.800375

Filename

1058158