DocumentCode
949797
Title
SEU resistance in advanced SOI-SRAMs fabricated by commercial technology using a rad-hard circuit design
Author
Hirose, K. ; Saito, H. ; Kuroda, Y. ; Ishii, S. ; Fukuoka, Y. ; Takahashi, D.
Author_Institution
Inst. of Space & Astron. Sci., Kanagawa, Japan
Volume
49
Issue
6
fYear
2002
fDate
12/1/2002 12:00:00 AM
Firstpage
2965
Lastpage
2968
Abstract
We fabricate 128 Kbit SRAMs using a rad-hard circuit design based on a mixed-mode three-dimensional simulation in a commercial silicon-on-insulator foundry with 0.2 μm design rules. Appropriate design increases the critical linear energy transfer of single-event upset over 164.4 MeV/(mg/cm2).
Keywords
SRAM chips; radiation hardening (electronics); silicon-on-insulator; 0.2 mm; 128 Kbit; SEU resistance; SOI SRAM; fabrication technology; linear energy transfer; mixed-mode three-dimensional simulation; rad-hard circuit design; silicon-on-insulator foundry; Circuit simulation; Circuit synthesis; Energy exchange; Immune system; MOSFETs; Radiation hardening; Silicon on insulator technology; Single event upset; Space technology; Substrates;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2002.805978
Filename
1134247
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