• DocumentCode
    950116
  • Title

    Effective photoconductivity and plasma depth in optically quasi-CW controlled microwave switching devices

  • Author

    Platte, W.

  • Author_Institution
    Universit¿¿t Erlangen-N¿¿rnberg, Institut f¿¿r Hochfrequenztechnik, Erlangen, West Germany
  • Volume
    135
  • Issue
    3
  • fYear
    1988
  • fDate
    6/1/1988 12:00:00 AM
  • Firstpage
    251
  • Lastpage
    254
  • Abstract
    The paper presents an analysis of the carrier diffusion and surface recombination processes in gap-structure MIC devices at quasi-CW laser excitation. Quite simple analytical expressions are obtained for the effective laser-induced photoconductivity and the plasma penetration depth. The formulas have been confirmed by experiment, and allow application of the well-known lumped element analysis of the gap region (often used in the field of optoelectronic microwave switching) even under quasi-CW or pure-CW excitation condition.
  • Keywords
    carrier lifetime; electron-hole recombination; microwave integrated circuits; photoconducting devices; semiconductor switches; solid-state plasma; analytical expressions; carrier diffusion; effective photoconductivity; gap region; gap-structure MIC devices; lumped element analysis; optically quasi-CW controlled microwave switching devices; plasma depth; plasma penetration depth; quasi-CW laser excitation; surface recombination processes;
  • fLanguage
    English
  • Journal_Title
    Optoelectronics, IEE Proceedings J
  • Publisher
    iet
  • ISSN
    0267-3932
  • Type

    jour

  • DOI
    10.1049/ip-j.1988.0048
  • Filename
    4648728