DocumentCode
952477
Title
Instrumentation for electron beam lithography
Author
Chang, T.H.P.
Author_Institution
IBM Thomas J. Watson Research Center, Yorktown Heights, NY, USA
Volume
10
Issue
3
fYear
1974
fDate
9/1/1974 12:00:00 AM
Firstpage
883
Lastpage
887
Keywords
Electron-beam fabrication; Magnetic bubble devices; Brightness; Electron beams; Electron optics; Guns; Instruments; Lanthanum; Lenses; Lithography; Optical sensors; Resists;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1974.1058450
Filename
1058450
Link To Document