DocumentCode :
952627
Title :
LSI Yield Projections Based Upon Test Pattern Results: An Application to Multilevel Metal Structures
Author :
Turley, A. ; Herman, David
Author_Institution :
Westinghouse Electric Corporation, Baltimore, MD
Volume :
10
Issue :
4
fYear :
1974
fDate :
12/1/1974 12:00:00 AM
Firstpage :
230
Lastpage :
234
Abstract :
Practical methods for making LSl yield projections are described in detail. The application of these methods to multilevel metal structures in particular is presented by means of example calculations of yield based on test pattern data. Using these methods the yield of any general multilevel metal interconnection pattern can be projected. It is shown that structural density, rather than chip area alone, should be the prime consideration in yield predictions.
Keywords :
Integrated circuit interconnections; Interconnections, Integrated circuits; LSI; Circuits; Degradation; Dielectrics; Differential equations; Insulation; Large scale integration; Metal-insulator structures; Testing;
fLanguage :
English
Journal_Title :
Parts, Hybrids, and Packaging, IEEE Transactions on
Publisher :
ieee
ISSN :
0361-1000
Type :
jour
DOI :
10.1109/TPHP.1974.1134868
Filename :
1134868
Link To Document :
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