DocumentCode
952876
Title
A Critical Evaluation of Tantalum Nitride Thin Film Resistors
Author
Berry, R.W. ; Jackson, W.H. ; Parisi, Giuseppe ; Schafer, A.H.
Author_Institution
Bell Telephone Laboratories, Inc.
Volume
11
Issue
2
fYear
1964
fDate
6/1/1964 12:00:00 AM
Firstpage
86
Lastpage
96
Abstract
An extensive evaluation program has been carried out on newly developed tantalum nitride thin film resistors that were specifically prepared for this purpose and which included several levels of four manufacturing variables, namely substrate material, film thickness, line width and anodizing voltage. Resistors were subjected to a series of non-destructive screening tests followed by severe environmental evaluation tests. Preliminary test results indicate that tantalum nitride thin film resistors with a high degree of reliability and stability can be commercially manufactured.
Keywords
Fabrication; Life testing; Manufacturing; Nondestructive testing; Protection; Resistors; Stability; Substrates; Surface resistance; Transistors;
fLanguage
English
Journal_Title
Component Parts, IEEE Transactions on
Publisher
ieee
ISSN
0097-6601
Type
jour
DOI
10.1109/TCP.1964.1134983
Filename
1134983
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