DocumentCode
953284
Title
Ultra low resistance ohmic contacts to n-GaAs
Author
Stall, Rick ; Wood, C.E.C. ; Board, K. ; Eastman, L.F.
Author_Institution
Cornell University, School of Electrical Engineering, Ithaca, USA
Volume
15
Issue
24
fYear
1979
Firstpage
800
Lastpage
801
Abstract
Nonalloyed ohmic contacts to n-GaAs with contact resistances (¿c) below 1·0Ã10¿7 ¿ cm2 have been obtained using a Ge/GaAs heterojunction system. Metals are evaporated on heavily arsenic-doped germanium (Ge) layers grown on GaAs. Low values of ¿c result from the low Schottky barrier height (¿ 0·50 eV) and the high doping levels obtainable for n-Ge(¿ 1020 cm¿3).
Keywords
III-V semiconductors; gallium arsenide; ohmic contacts; semiconductor-metal boundaries; Ge/GaAs heterojunction system; Schottky barrier height; doping levels; n-GaAs; ohmic contacts;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19790570
Filename
4243748
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