DocumentCode :
953284
Title :
Ultra low resistance ohmic contacts to n-GaAs
Author :
Stall, Rick ; Wood, C.E.C. ; Board, K. ; Eastman, L.F.
Author_Institution :
Cornell University, School of Electrical Engineering, Ithaca, USA
Volume :
15
Issue :
24
fYear :
1979
Firstpage :
800
Lastpage :
801
Abstract :
Nonalloyed ohmic contacts to n-GaAs with contact resistances (¿c) below 1·0×10¿7 ¿ cm2 have been obtained using a Ge/GaAs heterojunction system. Metals are evaporated on heavily arsenic-doped germanium (Ge) layers grown on GaAs. Low values of ¿c result from the low Schottky barrier height (¿ 0·50 eV) and the high doping levels obtainable for n-Ge(¿ 1020 cm¿3).
Keywords :
III-V semiconductors; gallium arsenide; ohmic contacts; semiconductor-metal boundaries; Ge/GaAs heterojunction system; Schottky barrier height; doping levels; n-GaAs; ohmic contacts;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19790570
Filename :
4243748
Link To Document :
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