The influence of light propagation direction on the stress-induced polarization dependence of silicon waveguides

Author

Huang, Min

Author_Institution

Silicon Technol. Dev., Texas Instrum. Inc., Dallas, TX

Volume

18

Issue

12

fYear

2006

fDate

6/1/2006 12:00:00 AM

Firstpage

1314

Lastpage

1316

Abstract

This letter studies the effects of light propagation direction on the stress-induced polarization dependence of silicon-based waveguides. Silicon is an anisotropic material, so the stresses and the corresponding change of polarization dependence vary with the light propagation directions. The analyses show that when the light propagates in lang010rang directions on (100) silicon, the stress-induced changes of refractive index and the birefringence in effective index are about 20% more sensitive to the stresses than those when the light propagates in lang011rang directions

Keywords

anisotropic media; birefringence; elemental semiconductors; light polarisation; optical waveguide theory; refractive index; silicon; Si; anisotropic material; birefringence; light propagation direction; refractive index; silicon waveguides; stress-induced polarization; Anisotropic magnetoresistance; Birefringence; Optical polarization; Optical propagation; Optical refraction; Optical waveguides; Refractive index; Silicon; Tensile stress; Waveguide transitions; Anisotropic media; birefringence; optical waveguides; polarization; silicon; stress;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2006.876746

Filename

1637707