Title :
The influence of light propagation direction on the stress-induced polarization dependence of silicon waveguides
Author_Institution :
Silicon Technol. Dev., Texas Instrum. Inc., Dallas, TX
fDate :
6/1/2006 12:00:00 AM
Abstract :
This letter studies the effects of light propagation direction on the stress-induced polarization dependence of silicon-based waveguides. Silicon is an anisotropic material, so the stresses and the corresponding change of polarization dependence vary with the light propagation directions. The analyses show that when the light propagates in lang010rang directions on (100) silicon, the stress-induced changes of refractive index and the birefringence in effective index are about 20% more sensitive to the stresses than those when the light propagates in lang011rang directions
Keywords :
anisotropic media; birefringence; elemental semiconductors; light polarisation; optical waveguide theory; refractive index; silicon; Si; anisotropic material; birefringence; light propagation direction; refractive index; silicon waveguides; stress-induced polarization; Anisotropic magnetoresistance; Birefringence; Optical polarization; Optical propagation; Optical refraction; Optical waveguides; Refractive index; Silicon; Tensile stress; Waveguide transitions; Anisotropic media; birefringence; optical waveguides; polarization; silicon; stress;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2006.876746
