• DocumentCode
    954643
  • Title

    Hard radiation effects in X-ray lithography

  • Author

    Znamirowski, Z. ; Czarczynski, Wojciech

  • Author_Institution
    Politechnika Wroclawska, Instytut Technologii Elektronewej, Wroclaw, Poland
  • Volume
    16
  • Issue
    5
  • fYear
    1980
  • Firstpage
    178
  • Lastpage
    179
  • Abstract
    Results of X-ray exposure of polymethyl methacrylate through various materials are described. These indicate that the hard radiation effect on exposed resist may be quite large.
  • Keywords
    photolithography; photoresists; polymers; PMMA photoresists; X-ray lithography; hard radiation effect; masks; photolithography; semiconductor device technology;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19800128
  • Filename
    4243924
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=954643