Title :
Hard radiation effects in X-ray lithography
Author :
Znamirowski, Z. ; Czarczynski, Wojciech
Author_Institution :
Politechnika Wroclawska, Instytut Technologii Elektronewej, Wroclaw, Poland
Abstract :
Results of X-ray exposure of polymethyl methacrylate through various materials are described. These indicate that the hard radiation effect on exposed resist may be quite large.
Keywords :
photolithography; photoresists; polymers; PMMA photoresists; X-ray lithography; hard radiation effect; masks; photolithography; semiconductor device technology;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19800128
