DocumentCode
955030
Title
GaxIn1¿xAsy P1¿y/InP d.h. laser emitting at 1.15 ¿m grown by low-pressure metalorganic c.v.d.
Author
Hirtz, J.P. ; Duchemin, J.P. ; Hirtz, P. ; de Cremoux, B. ; Pearsall, T. ; Bonnet, Marc
Author_Institution
Thomson-CSF, LCR, Orsay, France
Volume
16
Issue
8
fYear
1980
Firstpage
275
Lastpage
277
Abstract
We report the first successful operation of a GaxIn1¿xAsy P1¿y/InP double heterostructure laser grown by low-pressure metalorganic chemical vapour deposition. This broad-area contact laser, emitting at 1.15 ¿m, has a threshold current density of 5.9 kA/cm2 at room temperature. The efficiency of photoluminescence and electroluminescence below laser threshold is comparable to that measured in structures grown by liquid-phase epitaxy.
Keywords
III-V semiconductors; chemical vapour deposition; semiconductor growth; semiconductor junction lasers; vapour phase epitaxial growth; 1.15 micron wavelength; DH laser; GaxIn1-xAsyP1-y/InP double heterostructure laser; VPE; chemical vapour deposition; efficiency; electroluminescence; low pressure metalorganic CVD; photoluminescence; room temperature operation; semiconductor lasers; threshold current density 5.9 kA/cm2;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19800201
Filename
4243966
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