Micrometre-gate m.e.s.f.e.t.s on laser-annealed polysilicon

Schottky-barrier field-effect transistors (m.e.s.f.e.t.s) have been fabricated on uniformly doped laser-annealed polycrystalline silicon deposited on a silicon nitride insulator. The devices, which had aluminium Schottky-barrier gates and diffused n+ sources and drains but nonoptimised channel profiles, had about 65% the gm values of similar but optimised devices made on s.o.s. layers. Performance of these devices is considered adequate for certain innovative integrated-circuit technologies.