DocumentCode :
955619
Title :
Controlling deep transient depletion of an m.o.s. capacitor
Author :
Pedron, T.P. ; Lanteri, J.P. ; Garrigues, M. ; Urgell, J.J.
Author_Institution :
Ecole Centrale de Lyon, Laboratoire d´Electronique, Automatique et Mesures Electriques, Ecully, France
Volume :
16
Issue :
10
fYear :
1980
Firstpage :
367
Lastpage :
368
Abstract :
The transient surface potential ¿s of an m.o.s. capacitor is regulated to a given value ¿0 by controlling the gate voltage. Simultaneously, the oxide voltage drop, depletion layer charge and generation current are measured. We present an application of this circuit to the determination of the deep doping profile in a silicon substrate.
Keywords :
doping profiles; metal-insulator-semiconductor structures; surface potential; MOS capacitor; Si substrate; depletion layer charge; doping profile; gate voltage; oxide voltage drop; transient surface potential;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19800261
Filename :
4244028
Link To Document :
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