• DocumentCode
    955904
  • Title

    Capacitance-voltage analysis and current modeling of pulse-doped MODFETs

  • Author

    Roblin, Patrick ; Rohdin, Hans ; Hung, Chih Ju ; Chiu, Shu-wu

  • Author_Institution
    Dept. of Electr. Eng., Ohio State Univ., Columbus, OH, USA
  • Volume
    36
  • Issue
    11
  • fYear
    1989
  • fDate
    11/1/1989 12:00:00 AM
  • Firstpage
    2394
  • Lastpage
    2404
  • Abstract
    The correlation of the capacitance-voltage characteristics of fat MODFETs (FATFETs) to the current-voltage characteristics of FATFETs and the pulse-doped MODFET is reported. The measured gate capacitance is fitted using a noniterative numerical algorithm. The effective doping concentration of the GaAs buffer region and AlGaAs pulse-doped region is extracted along with the dependence of two-dimensional electron gas concentration upon the applied gate voltage. An excellent agreement between the threshold voltages calculated from the measured gate capacitance relation and the I-V characteristics is obtained for FATFETs. The correlation of the average threshold voltages of MODFETs and FATFETs appears to be technology-dependent. A good correlation of the average threshold voltage of MODFETs and FATFETs is observed on a wafer featuring Schottky gate diodes with good ideality coefficients. The comparison of the present semianalytic I-V model with a hydrodynamic model demonstrates that velocity overshoot above the GaAs peak stationary velocity does not appreciably improve the saturation transconductance. The two-dimensional field effects associated with the 2DEG channel width are also shown to bring a minimal contribution to the drain conductance of MODFETs.
  • Keywords
    III-V semiconductors; aluminium compounds; capacitance; gallium arsenide; high electron mobility transistors; semiconductor device models; 2DEG channel width; AlGaAs pulse-doped region; AlGaAs-GaAs; FATFETs; GaAs buffer region; Schottky gate diodes; capacitance-voltage characteristics; current modeling; current-voltage characteristics; drain conductance; effective doping concentration; fat MODFETs; gate capacitance; hydrodynamic model; noniterative numerical algorithm; pulse-doped MODFET; saturation transconductance; threshold voltages; two-dimensional electron gas concentration; velocity overshoot; Capacitance measurement; Capacitance-voltage characteristics; Current-voltage characteristics; Doping; Gallium arsenide; HEMTs; MODFETs; Semiconductor device modeling; Semiconductor process modeling; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.43659
  • Filename
    43659