DocumentCode
957435
Title
Injection-induced bandgap narrowing and its effects on the low-temperature operation of silicon bipolar transistors
Author
Cressler, John D. ; Tang, Denny Duan-Lee ; Yang, Edward S.
Author_Institution
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
Volume
36
Issue
11
fYear
1989
fDate
11/1/1989 12:00:00 AM
Firstpage
2576
Lastpage
2586
Abstract
The authors present evidence that injection-induced bandgap narrowing plays an important role in determining the low-temperature properties of silicon bipolar transistors. This phenomenon occurs when large concentrations of minority-carrier charge are injected into the quasi-neutral base region of the device under high-current conditions. A significant enhancement in the low-temperature transistor current gain in the high-current regime is produced that is unaccounted for in conventional device theory. Comparison of theoretical calculations as well as phenomenological modeling results to measured data supports the authors´ claims. The analysis suggests that an understanding of injection-induced bandgap narrowing is required for accurate modeling of bipolar transistors, particularly when they are used in low-temperature applications.
Keywords
bipolar transistors; elemental semiconductors; semiconductor device models; silicon; Si bipolar transistors; concentrations of minority-carrier charge; current gain enhancement; high-current conditions; injection-induced bandgap narrowing; low-temperature operation; low-temperature properties; phenomenological modeling; quasi-neutral base region; semiconductors; Bipolar transistors; CMOS technology; Delay; Digital circuits; Energy consumption; Photonic band gap; Semiconductor device modeling; Silicon; Temperature; Thermal conductivity;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.43682
Filename
43682
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