DocumentCode :
957498
Title :
A High-Stability RC Circuit Using High Nitrogen Doped Tantalum
Author :
Duff, O.J. ; Koerckel, Gerard J. ; Mayer, Edward H. ; Worobey, Walter
Author_Institution :
Western Electric Company,MA
Volume :
2
Issue :
2
fYear :
1979
fDate :
6/1/1979 12:00:00 AM
Firstpage :
221
Lastpage :
225
Abstract :
A fabrication process and reliability studies for RC hybrid integrated circuits utilizing alpha tantalum capacitors and tantalum nitride resistors are described. The alpha tantalum used in this study was reactively sputtered tantalum film containing from 10-20 atomic percent nitrogen and has a body centered cubic structure. The ac and dc characteristics of the alpha tantalum capacitors are in agreement with those shown by Anders and Rottersman [5], [6]. The longterm thermal stability of these capacitors is shown to be at least three times better than for beta tantalum capacitors. Accelerated life tests at various voltages show the alpha tantalum RC circuits to be at least equivalent in reliability to those using standard beta tantalum capacitors. The RC product shows excellent temperature compensation and stability during accelerated parametric aging tests which were done on production RC filter circuits.
Keywords :
RC filters; Tantalum alloys/compounds, devices; Tantalum devices; Thin-film circuit reliability; Capacitors; Circuit stability; Circuit testing; Fabrication; Hybrid integrated circuits; Integrated circuit reliability; Life estimation; Nitrogen; Resistors; Thermal stability;
fLanguage :
English
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
0148-6411
Type :
jour
DOI :
10.1109/TCHMT.1979.1135446
Filename :
1135446
Link To Document :
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