DocumentCode :
957732
Title :
Two-dimensional electron gas m.e.s.f.e.t. structure
Author :
Delagebeaudeuf, D. ; Delescluse, P. ; Etienne, P. ; Laviron, M. ; Chaplart, J. ; Linh, Nuyen T.
Author_Institution :
Thomson-CSF, Central Research Laboratories, Orsay, France
Volume :
16
Issue :
17
fYear :
1980
Firstpage :
667
Lastpage :
668
Abstract :
The first m.e.s.f.e.t. structure is reported in which the channel near pinch-off is occupied by a two-dimensional electron gas accumulated at the interface of a GaAs(N)-AlxGa1¿xAs(N) heterojunction. Experimental data are in good agreement with theoretical calculations.
Keywords :
III-V semiconductors; Schottky gate field effect transistors; aluminium compounds; electron gas; gallium arsenide; p-n heterojunctions; GaAs(N)-AlxGa1-xAs(N) heterojunction; III-V semiconductors; two dimensional electron gas MESFET structure;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19800473
Filename :
4244247
Link To Document :
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