DocumentCode
957755
Title
Sol-gel derived la modified PZT thin films: structure and properties
Author
Ravindra Singh ; Sudhir Chandra
Author_Institution
Centre for Appl. Res. in Electron., Indian Inst. of Technol., New Delhi, India
Volume
11
Issue
2
fYear
2004
fDate
4/1/2004 12:00:00 AM
Firstpage
264
Lastpage
270
Abstract
Lanthanum modified PZT thin films with compositions, namely 8/60/40, 8/70/30, 10/70/30 and 12/70/30 were deposited on platinized silicon substrates by sol-gel spin coating technique. Characterization of these films by XRD and SEM show that the films possess perovskite phase with submicron crystallite size. The saturation polarization (Ps), remnant polarization (PR) and coercive field (Ec) of polarization-electric field hysteresis loop are presented for all compositions. The 8/60/40 composition shows hysteresis loop with PR = 11 μC/cm2. The temperature dependence of dielectric constant and dielectric loss of these films are also studied. Leakage current densities for these thin films are found to be in the range of 10--10- A/cm2. To show the possible application of these thin films for micro electromechanical system (MEMS), a device incorporating an 8/60/40 PLZT thin film has been fabricated using silicon micromachining technology. This device functions satisfactorily as a vibration sensor with a resonance frequency of approximately 8.45 MHz.
Keywords
X-ray diffraction; dielectric losses; dielectric polarisation; ferroelectric thin films; lanthanum; lead compounds; micromachining; scanning electron microscopy; silicon; sol-gel processing; titanium compounds; zirconium compounds; SEM; XRD; coercive field; ferroelectric thin films; lanthanum modified PZT thin films; leakage current density; micro electromechanical system; platinized silicon substrates; polarization-electric field hysteresis loop; remnant polarization; resonance frequency; saturation polarization; silicon micromachining technology; sol-gel spin coating technique; Dielectric constant; Dielectric losses; Dielectric thin films; Hysteresis; Lanthanum; Polarization; Semiconductor thin films; Silicon; Thin film devices; Transistors;
fLanguage
English
Journal_Title
Dielectrics and Electrical Insulation, IEEE Transactions on
Publisher
ieee
ISSN
1070-9878
Type
jour
DOI
10.1109/TDEI.2004.1285896
Filename
1285896
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