Fabrication of Passive Components for High Temperature Instrumentation

Author

Raymond, Leonard S. ; Nelson, Louis N. ; Hamilton, Douglas J. ; Kerwin, William J.

Author_Institution

U. of Arizona;Tucson, AZ

Volume

2

Issue

4

fYear

1979

fDate

12/1/1979 12:00:00 AM

Firstpage

395

Lastpage

398

Abstract

Thin-film resistors and capacitors have been fabricated for use in geothermal well-logging tools. The resistors can operate from 25°C-500°C with a temperature coefficient below 100 ppm/°C; capacitors can operate from 25°C-350°C with a similar temperature coefficient. Chemical vapor deposition (CVD) is used to fabricate both resistors and capacitors. The processing is compatible with most microcircuit processes; and resistors, capacitors, interconnecting metallization, and possivation are all produced by CVD and can be integrated on a single substrate. Resistor material is tungsten-silicon, capacitor electrodes and metallization are tungsten, and dielectric material is silicon nitride. Photolithography is used to delineate component geometry.

Keywords

Geothermal power generation; Thin-film capacitor fabrication; Thin-film resistor fabrication; Capacitors; Chemical vapor deposition; Dielectric materials; Dielectric substrates; Fabrication; Instruments; Metallization; Resistors; Temperature; Transistors;

fLanguage

English

Journal_Title

Components, Hybrids, and Manufacturing Technology, IEEE Transactions on

Publisher

ieee

ISSN

0148-6411

Type

jour

DOI

10.1109/TCHMT.1979.1135490

Filename

1135490