Title :
Model Context Selection for Run-to-Run Control
Author :
Vanli, O. Arda ; Patel, Nital S. ; Janakiram, Mani ; Del Castillo, E.
Author_Institution :
Intel Corp., Chandler
Abstract :
In the design of run-to-run controllers one is usually faced with the problem of selecting a model structure that best explains the variability in the data. The variable selection problem often becomes more complex when there are large numbers of candidate variables and the usual regression modeling assumptions are not satisfied. This paper proposes a model selection approach that uses ideas from the statistical linear models and stepwise regression literature to identify the context variables that contribute most to the autocorrelation and to the offsets in the data. A simulation example and an application to lithography alignment control are presented to illustrate the approach.
Keywords :
autoregressive moving average processes; process control; regression analysis; semiconductor device manufacture; context variables; lithography alignment control; model context selection; model structure; regression modeling; run-to-run control; semiconductor manufacturing; statistical linear model; stepwise regression; variable selection problem; Analysis of variance; Autocorrelation; Context modeling; Input variables; Lithography; Manufacturing processes; Production; Semiconductor device manufacture; Stochastic processes; Transfer functions; Autoregressive-integrated-moving average (ARIMA) time series models; analysis of variance; context selection; run-to-run (R2R) control;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
DOI :
10.1109/TSM.2007.907628