• DocumentCode
    958092
  • Title

    Model Context Selection for Run-to-Run Control

  • Author

    Vanli, O. Arda ; Patel, Nital S. ; Janakiram, Mani ; Del Castillo, E.

  • Author_Institution
    Intel Corp., Chandler
  • Volume
    20
  • Issue
    4
  • fYear
    2007
  • Firstpage
    506
  • Lastpage
    516
  • Abstract
    In the design of run-to-run controllers one is usually faced with the problem of selecting a model structure that best explains the variability in the data. The variable selection problem often becomes more complex when there are large numbers of candidate variables and the usual regression modeling assumptions are not satisfied. This paper proposes a model selection approach that uses ideas from the statistical linear models and stepwise regression literature to identify the context variables that contribute most to the autocorrelation and to the offsets in the data. A simulation example and an application to lithography alignment control are presented to illustrate the approach.
  • Keywords
    autoregressive moving average processes; process control; regression analysis; semiconductor device manufacture; context variables; lithography alignment control; model context selection; model structure; regression modeling; run-to-run control; semiconductor manufacturing; statistical linear model; stepwise regression; variable selection problem; Analysis of variance; Autocorrelation; Context modeling; Input variables; Lithography; Manufacturing processes; Production; Semiconductor device manufacture; Stochastic processes; Transfer functions; Autoregressive-integrated-moving average (ARIMA) time series models; analysis of variance; context selection; run-to-run (R2R) control;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/TSM.2007.907628
  • Filename
    4369349