DocumentCode
958092
Title
Model Context Selection for Run-to-Run Control
Author
Vanli, O. Arda ; Patel, Nital S. ; Janakiram, Mani ; Del Castillo, E.
Author_Institution
Intel Corp., Chandler
Volume
20
Issue
4
fYear
2007
Firstpage
506
Lastpage
516
Abstract
In the design of run-to-run controllers one is usually faced with the problem of selecting a model structure that best explains the variability in the data. The variable selection problem often becomes more complex when there are large numbers of candidate variables and the usual regression modeling assumptions are not satisfied. This paper proposes a model selection approach that uses ideas from the statistical linear models and stepwise regression literature to identify the context variables that contribute most to the autocorrelation and to the offsets in the data. A simulation example and an application to lithography alignment control are presented to illustrate the approach.
Keywords
autoregressive moving average processes; process control; regression analysis; semiconductor device manufacture; context variables; lithography alignment control; model context selection; model structure; regression modeling; run-to-run control; semiconductor manufacturing; statistical linear model; stepwise regression; variable selection problem; Analysis of variance; Autocorrelation; Context modeling; Input variables; Lithography; Manufacturing processes; Production; Semiconductor device manufacture; Stochastic processes; Transfer functions; Autoregressive-integrated-moving average (ARIMA) time series models; analysis of variance; context selection; run-to-run (R2R) control;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/TSM.2007.907628
Filename
4369349
Link To Document