• DocumentCode
    958103
  • Title

    Theory and Practice of MOS Processing Techniques-1973

  • Author

    Kmeta, Walter J. ; Nadan, Joseph S.

  • Author_Institution
    SMC Microsystems Corp.,Hauppauge, NY
  • Volume
    2
  • Issue
    2
  • fYear
    1973
  • fDate
    12/1/1973 12:00:00 AM
  • Firstpage
    37
  • Lastpage
    49
  • Abstract
    Current industrial practice and theory applicable to the fabrication of low-voltage p-channel metal-oxide-semiconductor (PMOS) devices is summarized. An extensive bibliography and design parameter graphs are presented.
  • Keywords
    Cleaning; Etching; Fabrication; Lithography; MOS devices; Manufacturing industries; Pulp manufacturing; Resists; Silicon; Sliding mode control;
  • fLanguage
    English
  • Journal_Title
    Manufacturing Technology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0046-838X
  • Type

    jour

  • DOI
    10.1109/TMFT.1973.1135507
  • Filename
    1135507
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=958103