Title :
Theory and Practice of MOS Processing Techniques-1973
Author :
Kmeta, Walter J. ; Nadan, Joseph S.
Author_Institution :
SMC Microsystems Corp.,Hauppauge, NY
fDate :
12/1/1973 12:00:00 AM
Abstract :
Current industrial practice and theory applicable to the fabrication of low-voltage p-channel metal-oxide-semiconductor (PMOS) devices is summarized. An extensive bibliography and design parameter graphs are presented.
Keywords :
Cleaning; Etching; Fabrication; Lithography; MOS devices; Manufacturing industries; Pulp manufacturing; Resists; Silicon; Sliding mode control;
Journal_Title :
Manufacturing Technology, IEEE Transactions on
DOI :
10.1109/TMFT.1973.1135507
