• DocumentCode
    958336
  • Title

    Deposition of magnetite films by reactive sputtering of iron

  • Author

    Heller, Johannes

  • Author_Institution
    German Manufacturing Technology Center, IBM Deutschland GmbH, Sindelfingen, Germany
  • Volume
    12
  • Issue
    4
  • fYear
    1976
  • fDate
    7/1/1976 12:00:00 AM
  • Firstpage
    396
  • Lastpage
    400
  • Abstract
    Iron is sputtered reactively in an argon-oxygen glow discharge to form deposits of magnetite. Cycling the oxygen partial pressure between a low and a high value during sputtering causes deposition of alternating layers of Fe-metal and Fe2O3-oxide. Depending on the cycle length, a layered structure results or homogeneous films form. For all films pronounced magnetite peaks were found by X-ray analysis. In the case of homogeneous films only magnetite was found. The films were hard-magnetic with coercivities between 250 Oe and 550 Oe and squarenesses between 0.6 and 0.8. Magnetic recording of these films on 14-in disks yielded bit-densities of up to 6.5 kT/cm.
  • Keywords
    Magnetic disk recording; Magnetic films; Sputtering; Argon; Cathodes; Iron; Magnetic films; Magnetic materials; Magnetic recording; Sputtering; Substrates; Temperature; Valves;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1976.1059043
  • Filename
    1059043