DocumentCode :
958336
Title :
Deposition of magnetite films by reactive sputtering of iron
Author :
Heller, Johannes
Author_Institution :
German Manufacturing Technology Center, IBM Deutschland GmbH, Sindelfingen, Germany
Volume :
12
Issue :
4
fYear :
1976
fDate :
7/1/1976 12:00:00 AM
Firstpage :
396
Lastpage :
400
Abstract :
Iron is sputtered reactively in an argon-oxygen glow discharge to form deposits of magnetite. Cycling the oxygen partial pressure between a low and a high value during sputtering causes deposition of alternating layers of Fe-metal and Fe2O3-oxide. Depending on the cycle length, a layered structure results or homogeneous films form. For all films pronounced magnetite peaks were found by X-ray analysis. In the case of homogeneous films only magnetite was found. The films were hard-magnetic with coercivities between 250 Oe and 550 Oe and squarenesses between 0.6 and 0.8. Magnetic recording of these films on 14-in disks yielded bit-densities of up to 6.5 kT/cm.
Keywords :
Magnetic disk recording; Magnetic films; Sputtering; Argon; Cathodes; Iron; Magnetic films; Magnetic materials; Magnetic recording; Sputtering; Substrates; Temperature; Valves;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1976.1059043
Filename :
1059043
Link To Document :
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