DocumentCode
959268
Title
Novel Process for Fabricating Nichrome-Aluminum Film Resistor Networks
Author
Singh, Awatar
Author_Institution
CEERI,Pilani,India
Volume
3
Issue
3
fYear
1980
fDate
9/1/1980 12:00:00 AM
Firstpage
453
Lastpage
453
Abstract
A novel process for the fabrication of nichrome-aluminium based thin-film resistor networks on glass plates is described. The process uses only an aluminium etchant, and it can also be used with a cermet-aluminium film system. Various advantages of the process are pointed out.
Keywords
Aluminum devices; Chromium alloys/compounds, devices; Iron alloys/compounds, devices; Nickel alloys/compounds, devices; Thin-film resistor fabrication; Aluminum; Ceramics; Conductive films; Etching; Glass; Resistors; Resists; Substrates; Temperature; Transistors;
fLanguage
English
Journal_Title
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher
ieee
ISSN
0148-6411
Type
jour
DOI
10.1109/TCHMT.1980.1135633
Filename
1135633
Link To Document