DocumentCode :
959295
Title :
Computer Control and Data Management in an LSI Fabrication Facility
Author :
Doyal, Leg A. ; Weaver, Douglas L. ; Gwyn, Charles W.
Author_Institution :
Sandia National Laboratories, NM
Volume :
3
Issue :
3
fYear :
1980
fDate :
9/1/1980 12:00:00 AM
Firstpage :
339
Lastpage :
344
Abstract :
A minicomputer system is used to control diffusion furnaces, monitor temperatures, provide operator instructions for each processing step, and record detailed process histories for wafer lots fabricated in the Sandia Semiconductor Development Laboratory. The system provides a complete data base for laboratory operations, a variety of displays describing equipment status, scheduling and utilization summaries for equipment, wafer and mask inventories, and laboratory management information. The wafer lot history includes a record indicating the operator, time, date, and specification recipe for each process step, special notes summarizing process deviations, results of inspection steps, and in-line capacitance, oxide thickness, or resistivity measurements.
Keywords :
Integrated circuit fabrication; Management information systems; Manufacturing data processing; Minicomputer applications; Process control; Control systems; Fabrication; Furnaces; History; Laboratories; Large scale integration; Microcomputers; Temperature control; Temperature measurement; Temperature sensors;
fLanguage :
English
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
0148-6411
Type :
jour
DOI :
10.1109/TCHMT.1980.1135636
Filename :
1135636
Link To Document :
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