DocumentCode :
959598
Title :
Influence of the dislocation density on the performance of heteroepitaxial indium phosphide solar cells
Author :
Jain, Raj K. ; Flood, Dennis J.
Author_Institution :
NASA Lewis Res. Center, Cleveland, OH, USA
Volume :
40
Issue :
11
fYear :
1993
fDate :
11/1/1993 12:00:00 AM
Firstpage :
1928
Lastpage :
1934
Abstract :
The authors point out that heteroepitaxial indium phosphide solar cells developed to date have low efficiency due to misfit dislocations. Dislocations act as recombination centers and strongly influence the solar cell performance. Calculations have been made to study the dependence of heteroepitaxial InP solar cell efficiency on dislocation density. The effects of surface recombination velocity and cell emitter thickness are also considered. Calculated results are compared with the available experimental results on representative InP solar cells. It is shown that heteroepitaxial InP cells with over 20% AM0 efficiency could be fabricated if dislocation density can be reduced to <105 cm-2 and the surface recombination velocity reduced to <105 cm/s
Keywords :
III-V semiconductors; carrier lifetime; dislocation density; electron-hole recombination; indium compounds; minority carriers; solar cells; vapour phase epitaxial growth; 20 percent; AM0 efficiency; InP-InGaAs-GaAs; MOCVD growth; cell emitter thickness; dislocation density; heteroepitaxial InP solar cell; minority carrier diffusion length; misfit dislocations; recombination centers; solar cell performance; surface recombination velocity; Buffer layers; Floods; Gallium arsenide; Helium; Indium phosphide; Lattices; MOCVD; Photovoltaic cells; Silicon; Substrates;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.239730
Filename :
239730
Link To Document :
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