Abstract :
The results of the study of sputtered molybdenum-silicon contact is reported. The contact resistance has been found to be in the range of 3-6 µΩ ċ cm2when the composite structure is annealed at 1050°C for 30 min in nitrogen ambient. Application of passivating layer of boron-doped glass over the molybdenum and subsequent annealing at the said temperature reduced this to 2-3 µΩ ċ cm2.