DocumentCode :
959637
Title :
Ferrite thin films for high recording density
Author :
Inagaki, N. ; Hattori, S. ; Ishii, Y. ; Terada, A. ; Katsuraki, H.
Author_Institution :
Nippon Telegraph and Telephone Public Corporation, Tokai, Ibaraki, Japan
Volume :
12
Issue :
6
fYear :
1976
fDate :
11/1/1976 12:00:00 AM
Firstpage :
785
Lastpage :
787
Abstract :
Ferrite thin films with superior mechanical and magnetic properties for a magnetic disk medium have been obtained using reactive sputtering. Recording characteristics of these films considerably exceed those of a conventional γ-Fe2O3coating medium. Hematite thin films were produced on an aluminium alloy substrate by sputtering Fe-Al-Co alloy target in an atmosphere of mixed argon and oxygen. Hematite films were transformed to ferrite films by reduction in hydrogen atmosphere for 2-4 hours at 300°C. The substrate used was covered with a thin alumite layer formed by anodic oxidation to improve surface hardness.
Keywords :
Ferrites; Magnetic disk recording; Magnetic films; Sputtering; Aluminum alloys; Argon; Atmosphere; Coatings; Disk recording; Ferrite films; Magnetic films; Magnetic properties; Magnetic recording; Sputtering;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1976.1059174
Filename :
1059174
Link To Document :
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