• DocumentCode
    960047
  • Title

    Ultra-high efficiency light-emitting-diode arrays

  • Author

    Schnitzer, I. ; Yablonovitch, Eli ; Ersen, Ali ; Scherer, Axel ; Caneau, Catherine ; Gmitter, T.J.

  • Author_Institution
    Dept. of Electr. Eng., Univ. of California, Los Angeles, CA
  • Volume
    40
  • Issue
    11
  • fYear
    1993
  • fDate
    11/1/1993 12:00:00 AM
  • Firstpage
    2108
  • Lastpage
    2109
  • Abstract
    Summary form only given. An approach to increasing the escape probability for light-emitting diodes (LEDs) is proposed which involves the angular randomization by elastic scattering of the photons from a textured semiconductor surface. The approach has two components: (i) separation of thin-film heterojunctions from the growth substrate using the epitaxial liftoff (ELO) technique, and (ii) nanotexturing of the thin-film semiconductor interface by natural lithography. The LED structure is a conventional n+-AlGaAs/p-GaAs/p+-AlGaAs double heterostructure, grown over a 0.05 μm thick AlAs release layer by organometallic chemical vapor deposition. The light versus current characteristics of the LEDs have been measured and modeled. A 9% external quantum efficiency from the untextured LED array was observed, transforming into a 30% external quantum efficiency following the surface texturing treatment. It is concluded that, by employing the principle of phase-space-filling in an improved device geometry, 56% efficient LED arrays can be expected
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; light emitting diodes; surface treatment; 0.05 micron; 30 percent; 56 percent; 9 percent; AlAs; AlAs release layer; AlGaAs-GaAs-AlGaAs; LED array; angular randomization; epitaxial liftoff; escape probability; external quantum efficiency; growth substrate; light versus current characteristics; light-emitting-diode arrays; n+-AlGaAs/p-GaAs/p+-AlGaAs double heterostructure; nanotexturing; natural lithography; organometallic chemical vapor deposition; phase-space-filling; photon elastic scattering; textured semiconductor surface; thin-film heterojunctions; thin-film semiconductor interface; ultra high efficiency; untextured LED array; Heterojunctions; Light emitting diodes; Light scattering; Lithography; Optical arrays; Particle scattering; Phased arrays; Semiconductor thin films; Substrates; Surface texture;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.239776
  • Filename
    239776