Title :
Demonstrating the potential of 6-H silicon carbide for power devices
Author :
Palmour, John W. ; Edmond, J.A.
Author_Institution :
Cree Res. Inc., Durham, NC
fDate :
11/1/1993 12:00:00 AM
Abstract :
Summary form only given. Discusses the first vertical UMOS power MOSFETs ever reported in SiC, shows the highest gain 6H-SiC BJTs (bipolar junction transistors) and thyristors ever reported, and demonstrate the high-temperature operation of these devices. Vertical power MOSFETs fabricated in 6H-SiC with a UMOS design have specific on-resistances as low as 38 mΩ-cm2 at a gate bias of +12 V. These devices can have current densities as high as 190 A/cm2 (0.32 A/cm of gate periphery) and can dissipate a maximum power density of 5.4 kW/cm2. SiC BJTs have been demonstrated up to 400°C. The device structure used a reactive ion etched emitter with sintered Ni contacts to both the emitter and collector, and Al/Ti alloy contacts to the base. Four-layer structures have also been demonstrated in 6H-SiC, with p-n-p-n thyristors showing 100 V operation
Keywords :
bipolar transistors; carrier density; insulated gate field effect transistors; semiconductor materials; silicon compounds; sputter etching; thyristors; 100 V; 400 degC; BJTs; SiC; current densities; four-layer structures; gate bias; high-temperature operation; maximum power density; on-resistances; p-n-p-n thyristors; reactive ion etched emitter; thyristors; vertical UMOS power MOSFETs; Conductivity; Current density; Epitaxial layers; MOSFETs; Photonic band gap; Rectifiers; Silicon carbide; Temperature; Thyristors; Voltage;
Journal_Title :
Electron Devices, IEEE Transactions on