DocumentCode :
960568
Title :
Normal incidence detector using Ge quantum-well structures grown on Si (100)
Author :
Lee, Chi-Kwan ; Chun, S.K. ; Wang, K.L.
Author_Institution :
Dept. of Electr. Eng., California Univ., Los Angeles, CA
Volume :
40
Issue :
11
fYear :
1993
fDate :
11/1/1993 12:00:00 AM
Firstpage :
2141
Lastpage :
2142
Abstract :
Summary form only given. The normal incidence detection of light by Sb δ-doped Ge/Si1-xGex multiple quantum well (MQW) structures grown on Si(100) substrates has been demonstrated. The observation of strong electron intersubband infrared absorption for δ-doped Ge/Si1-xGex MQW structures grown on Si (100) substrates is reported. The principle is to use tilted ellipsoids of Ge L valleys to obtain normal incidence transition. The structure is grown by Si molecular beam epitaxy (Si-MBE) and Sb is doped by thermal evaporation. The intersubband absorption is shown to be allowed for the optical field components both perpendicular and parallel to the quantum wells due to the tilted ellipsoids of constant energy surfaces
Keywords :
Ge-Si alloys; elemental semiconductors; germanium; infrared detectors; infrared spectra of inorganic solids; molecular beam epitaxial growth; photodetectors; semiconductor epitaxial layers; semiconductor growth; semiconductor quantum wells; δ-doped structure; (100) surface; Ge-Si1-xGex multiple quantum well structure; MBE; MQW structures; Si molecular beam epitaxy; Si substrate; constant energy surfaces; electron intersubband infrared absorption; normal incidence detector; optical field components; thermal evaporation; tilted ellipsoids; Bipolar transistors; Circuit testing; Detectors; Indium phosphide; Leakage current; Photonic band gap; Quantum wells; Substrates; Temperature; Tunneling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.239829
Filename :
239829
Link To Document :
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