DocumentCode :
961444
Title :
Industrial Ion Implantation Machines
Author :
Ryding, Geoffrey ; Wittkower, Andrew B.
Author_Institution :
Extrion Corp,Gloucester, Mass
Volume :
4
Issue :
1
fYear :
1975
fDate :
9/1/1975 12:00:00 AM
Firstpage :
21
Lastpage :
31
Abstract :
In the last few years the use of small accelerators for ion implantation has been firmly established as an important manufacturing process in the fabrication of microelectronic devices and circuits. Before 1968 the only machines available for implantation were those designed originally for nuclear research, isotope separation, or neutron generation and adapted for implantation purposes. Since then, equipment has evolved to meet the specific needs of commercial applications. This paper discusses certain accelerator components where the changes have been most pronounced.
Keywords :
Ion accelerators; Ion implantation; Circuits; Fabrication; Ion accelerators; Ion implantation; Isotopes; Manufacturing industries; Manufacturing processes; Microelectronics; Neutrons; Nuclear power generation;
fLanguage :
English
Journal_Title :
Manufacturing Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
0046-838X
Type :
jour
DOI :
10.1109/TMFT.1975.1135858
Filename :
1135858
Link To Document :
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