DocumentCode :
962124
Title :
Laser Processing in Silicon Microelectronics Technology
Author :
Leamy, H.J.
Author_Institution :
Bell Laboratories, Murray Hill, NJ, USA
Volume :
5
Issue :
1
fYear :
1982
fDate :
3/1/1982 12:00:00 AM
Firstpage :
112
Lastpage :
117
Abstract :
Laser irradiation may effect either thermal or chemical changes in target materials. A brief review of the mechanisms involved and a summary assessment of their potential for application in silicon microelectronics technology is presented.
Keywords :
Integrated circuit fabrication; Laser applications, materials processing; Silicon materials/devices; Chemical lasers; Chemical technology; Electron beams; Integrated circuit technology; Laser beam cutting; Laser beams; Microelectronics; Optical materials; Silicon; Temperature;
fLanguage :
English
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
0148-6411
Type :
jour
DOI :
10.1109/TCHMT.1982.1135928
Filename :
1135928
Link To Document :
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