DocumentCode
962992
Title
Preparation by sputtering of thick sendust film suited for recording head core
Author
Shibaya, Hiromichi ; Fukuda, Isuke
Author_Institution
Technical Research Laboratories, NHK (Broadcasting Corporation of Japan), Setagaya-ku, Tokyo, Japan
Volume
13
Issue
4
fYear
1977
fDate
7/1/1977 12:00:00 AM
Firstpage
1029
Lastpage
1035
Abstract
A 12 μm thick film with large saturation flux density, 11 000 G, and high effective permeability, such as 240 at 20 MHz, was prepared by using tetrode sputtering equipment from a ternary alloy that consisted of Si:10.5 wt.%, Al:5.6 wt.%, and Fe:bal. (Si rich Sendust alloy) at a target voltage of 1000 VDC . These were the best conditions for obtaining the minimum value of coercivity with the glass substrate in our experiments. The electric resistivity and Vickers hardness of the film became greater than the same qualities in bulk alloys. The increase in effective permeability at high frequencies, and the higher resistivity and hardness are believed to originate from the granular structure of the film. In this study, it was proved that the magnetic properties, especially the coercivity and the initial permeability of the film were due, not only to the effect of magnetostriction and crystalline anisotropy, but also to the effect of film structure.
Keywords
Magnetic recording/reading heads; Sputtering; Coercive force; Glass; Magnetic films; Magnetic heads; Permeability; Silicon alloys; Sputtering; Substrates; Thick films; Voltage;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1977.1059508
Filename
1059508
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