Title :
Frequency-Thermal Characterization of On-Chip Transformers With Patterned Ground Shields
Author :
Shi, Jinglin ; Yin, Wen-Yan ; Kang, Kai ; Mao, Jun-Fa ; Li, Le-Wei
Author_Institution :
Inst. of Microelectron., Singapore
Abstract :
Extensive studies on the performance of on-chip CMOS transformers with and without patterned ground shields (PGSs) at different temperatures are carried out in this paper. These transformers are fabricated using 0.18-mum RF CMOS processes and are designed to have either interleaved or center-tapped interleaved geometries, respectively, but with the same inner dimensions, metal track widths, track spacings, and silicon substrate. Based on the two-port S-parameters measured at different temperatures, all performance parameters of these transformers, such as frequency- and temperature-dependent maximum available gain (Gmax), minimum noise figure (NFmin), quality factor (Q1) of the primary or secondary coil, and power loss (Ploss) are characterized and compared. It is found that: 1) the values of the Gmax and Q1 factor usually decrease with the temperature; however, there may be reverse temperature effects on both G max and Q1 factor beyond certain frequency; 2) with the same geometric parameters, interleaved transformers exhibit better low-frequency performance than center-tapped interleaved transformers, whereas the center-tapped configurations possess lower values of NFmin at higher frequencies; and 3) with temperature rising, the degradation in performance of the interleaved transformers can be effectively compensated by the implementation of a PGS, while for center-tapped geometry, the shielding effectiveness of PGS on the performance improvement is ineffective
Keywords :
CMOS integrated circuits; S-parameters; earthing; radiofrequency integrated circuits; transformers; 0.18 micron; RF CMOS processes; S-parameters; center-tapped geometry; center-tapped interleaved transformers; frequency-thermal characterization; on-chip CMOS transformers; patterned ground shields; quality factor; silicon substrate; CMOS process; Geometry; Land surface temperature; Noise measurement; Process design; Radio frequency; Scattering parameters; Silicon; Temperature measurement; Transformers; Interleaved and center-tapped transformers; maximum available gain; minimum noise figure; pattern ground shields (PGSs); power loss; quality ($Q$) factor; temperature;
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
DOI :
10.1109/TMTT.2006.888934