• DocumentCode
    963080
  • Title

    Ultraviolet emission from OH and ArD in microcavity plasma devices

  • Author

    Ricconi, B.J. ; Park, S.-J. ; Sung, S.H. ; Tchertchian, P.A. ; Eden, J.G.

  • Author_Institution
    Univ. of Illinois, Urbana
  • Volume
    43
  • Issue
    22
  • fYear
    2007
  • Abstract
    Intense emission in the ultraviolet (250-400 nm) from OH (A2Sigma+) and the rare gas-deuteride excimer ArD has been observed from mixtures of H2O vapour or D2 in Ar and excited in microcavity plasma devices. Peak wavelength-integrated intensities are measured for H2O and D2 concentrations of ~0.16% and 0.5-1%, respectively. Spectral simulations indicate the OH (A2Sigma+, v´ = 0) rotational temperature to be 440 plusmn 20 K for 600 Torr Ar/0.3 Torr H2O mixtures excited in a 45 nL microcavity.
  • Keywords
    argon compounds; deuterium; excimers; gas mixtures; microcavities; oxygen compounds; plasma collision processes; plasma devices; water; ArD; ArD ultraviolet emission; D2; H2O; OH; OH ultraviolet emission; intense ultraviolet emission; microcavity plasma devices; pressure 0.3 torr; pressure 600 torr; rare gas-deuteride excimer; rotational temperature; water-deuterium gas mixture; wavelength 250 nm to 400 nm;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20071673
  • Filename
    4375447
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=963080