• DocumentCode
    964150
  • Title

    Prospects for X-ray amplification with charge-displacement self-channeling

  • Author

    Solem, Johndale C. ; Luk, Ting Shan ; Boyer, Keith ; Rhodes, Charles Kirkham

  • Author_Institution
    Los Alamos Nat. Lab., NM, USA
  • Volume
    25
  • Issue
    12
  • fYear
    1989
  • fDate
    12/1/1989 12:00:00 AM
  • Firstpage
    2423
  • Lastpage
    2430
  • Abstract
    The authors develop an analytic theory of charge-displacement self-channeling, a mechanism that can dynamically trap a short intense pulse of light. Attention is focused on the case of most interest for X-ray amplification: the strongly saturated channel, for which all free electrons are expelled from the channel core and the channel walls are overdense. Some curious results are: (1) the intensity at the channel walls is independent of the total laser power, (2) the radius of the channel increases very slowly with laser power, asymptotically as the fourth root, and (3) the power in the channel wall is a constant. It is also found that the channel is an effective waveguide for all secondary radiation. Scaling studies show that there is a substantial advantage in using the highest-frequency driving laser available. The channel is ideal for generating coherent short-wavelength radiation, perhaps well into the X-ray range
  • Keywords
    X-ray lasers; channelling radiation; high-speed optical techniques; light coherence; optical waveguides; X-ray amplification; X-ray range; channel core; channel core expelled free electrons; channel radius; channel wall laser power; channel walls; charge-displacement self-channeling; coherent short-wavelength radiation; dynamically trap; effective waveguide; free electrons; highest-frequency driving laser; laser power; light pulse trapping; overdense channel walls; radiation generation; secondary radiation; short intense light pulse; strongly saturated channel; total laser power; Dielectrics; Diffraction; Electrons; Gaussian processes; Ionization; Laser modes; Optical reflection; Plasma density; Plasma materials processing; Steady-state;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/3.40625
  • Filename
    40625