Title :
Technological Advances in Physical Vapor Deposition
Author :
Herklotz, Guenther ; Eligehausen, Hans
Author_Institution :
W. C. Heraeus, Hanau, West Germany
fDate :
6/1/1983 12:00:00 AM
Abstract :
In the production of contact materials physical vapor deposition (PVD) technology is widely used. After a short description of the different PVD processes, the influences of the most important process parameters on the plating quality will be discussed. Also some technological applications will be cited.
Keywords :
Coatings; Contacts; Ion radiation effects/protection; Vacuum technology; Atherosclerosis; Boats; Chemical technology; Chemical vapor deposition; Coatings; Inorganic materials; Production; Resistance heating; Sputtering; Vacuum technology;
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
DOI :
10.1109/TCHMT.1983.1136170
