DocumentCode :
964596
Title :
Technological Advances in Physical Vapor Deposition
Author :
Herklotz, Guenther ; Eligehausen, Hans
Author_Institution :
W. C. Heraeus, Hanau, West Germany
Volume :
6
Issue :
2
fYear :
1983
fDate :
6/1/1983 12:00:00 AM
Firstpage :
173
Lastpage :
180
Abstract :
In the production of contact materials physical vapor deposition (PVD) technology is widely used. After a short description of the different PVD processes, the influences of the most important process parameters on the plating quality will be discussed. Also some technological applications will be cited.
Keywords :
Coatings; Contacts; Ion radiation effects/protection; Vacuum technology; Atherosclerosis; Boats; Chemical technology; Chemical vapor deposition; Coatings; Inorganic materials; Production; Resistance heating; Sputtering; Vacuum technology;
fLanguage :
English
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
0148-6411
Type :
jour
DOI :
10.1109/TCHMT.1983.1136170
Filename :
1136170
Link To Document :
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