DocumentCode :
9648
Title :
Statistical SBD Modeling and Characterization and Its Impact on SRAM Cells
Author :
Soo Young Kim ; Chih-Hsiang Ho ; Roy, Kaushik
Author_Institution :
Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
Volume :
61
Issue :
1
fYear :
2014
fDate :
Jan. 2014
Firstpage :
54
Lastpage :
59
Abstract :
In this paper, we present a physics-based SPICE model for statistical soft breakdown (SBD) in ultrathin oxide. Statistical SBD induces an increase in gate leakage current (IG_BD) based on the time to breakdown (tBD) and the location of the percolation path in the channel. The proposed model has been validated with experimental data, and fed into circuit simulators to predict the degradation of device/circuit performance. Using the model, we analyzed the impact of the increased IG_BD due to the first SBD on cell stability and performance in SRAM cells. We observed that IG_BD variation due to SBD increases READ and WRITE failure probability, resulting in reduced lifetime.
Keywords :
SPICE; SRAM chips; statistical analysis; SRAM cells; WRITE failure probability; cell stability; circuit simulators; degradation; device/circuit performance; gate leakage current; percolation path; physics based SPICE model; statistical SBD modeling; statistical soft breakdown; ultrathin oxide; Analytical models; Degradation; Integrated circuit modeling; Logic gates; SRAM cells; Stability analysis; Stress; Soft breakdown (SBD); static random access memory (SRAM); time-dependent dielectric breakdown (TDDB);
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2013.2292060
Filename :
6678540
Link To Document :
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