DocumentCode
964898
Title
Electron-beam fabricated high-speed digital GaAs integrated circuits
Author
Greiling, Paul T. ; Lee, Robert E. ; Ozdemir, Faik S. ; Schmitz, Adele E.
Author_Institution
Hughes Research Laboratory, Malibu, CA
Volume
70
Issue
1
fYear
1982
Firstpage
52
Lastpage
59
Abstract
The fabrication and performance of high-speed GaAs logic circuits incorporating submicrometer gate length FET´s fabricated by electron-beam lithography are discussed. The process technology required for realizing 0.5-µm gate length devices is detailed. High-speed results including a 10-GHz logic gate, 34-ps gate delay for a ring oscillator, and a 4-GHz flip-flop are described.
Keywords
Digital integrated circuits; FETs; Fabrication; Gallium arsenide; High speed integrated circuits; Integrated circuit technology; Lithography; Logic circuits; Logic devices; Logic gates;
fLanguage
English
Journal_Title
Proceedings of the IEEE
Publisher
ieee
ISSN
0018-9219
Type
jour
DOI
10.1109/PROC.1982.12230
Filename
1456498
Link To Document