DocumentCode :
965337
Title :
Wafer-scale integration using restructurable VLSI
Author :
Anderson, Allan H. ; Raffel, Jack I. ; Wyatt, Peter W.
Author_Institution :
MIT Lincoln Lab., Lexington, MA, USA
Volume :
25
Issue :
4
fYear :
1992
fDate :
4/1/1992 12:00:00 AM
Firstpage :
41
Lastpage :
47
Abstract :
Results from a restructurable very large scale integration (RVLSI) program show the viability of using a laser to restructure wafer-scale circuits for customization and defect avoidance. Wafer-scale circuits are built with a standard integrated circuit fabrication process when the diffused-link restructuring device is used. Nine wafer-scale systems that have been built using the RVLSI technique are described. It is shown that the laser interconnection process has high yield and provides the high reliability of monolithic circuitry. The technology is well suited to signal processing systems, which characteristically use many replications of a small number of circuits and often have modest interconnection requirements.<>
Keywords :
VLSI; integrated circuit technology; optical interconnections; diffused-link restructuring; laser interconnection process; restructurable very large scale integration; wafer-scale circuits; Circuit testing; Clocks; Filters; Foundries; Integrated circuit interconnections; Laboratories; Optical device fabrication; Signal design; Very large scale integration; Wafer scale integration;
fLanguage :
English
Journal_Title :
Computer
Publisher :
ieee
ISSN :
0018-9162
Type :
jour
DOI :
10.1109/2.129046
Filename :
129046
Link To Document :
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