DocumentCode
965622
Title
Electron Mobility Model for 〈110 〉 Stressed Silicon Including Strain-Dependent Mass
Author
Dhar, Siddhartha ; Ungersböck, Enzo ; Kosina, Hans ; Grasser, Tibor ; Selberherr, Siegfried
Author_Institution
Inst. fur Microelectron., Technische Univ. Wien
Volume
6
Issue
1
fYear
2007
Firstpage
97
Lastpage
100
Abstract
Stress-induced enhancement of electron mobility has primarily been attributed to the splitting of the conduction band minima. However, experiments have indicated that the mobility enhancement cannot solely be attributed to this effect, and a recent study has shown that stress along the lang110rang direction leads to a change of the effective mass. This work investigates the effect of the variation of the effective mass with stress along the lang110rang direction on the electron mobility. An improved low-field mobility model incorporating the effective mass change is presented
Keywords
conduction bands; effective mass; electron mobility; elemental semiconductors; piezoelectricity; silicon; Si; conduction band; effective mass; electron mobility model; strain-dependent mass; stress-induced mobility enhancement; stressed silicon; Capacitive sensors; Charge carrier processes; Effective mass; Electron mobility; Geometry; Monte Carlo methods; Occupational stress; Silicon; Tensile stress; Uniaxial strain; Effective mass; low-field mobility; mobility model; uniaxial stress/strain;
fLanguage
English
Journal_Title
Nanotechnology, IEEE Transactions on
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2006.888533
Filename
4063326
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