• DocumentCode
    965622
  • Title

    Electron Mobility Model for 〈110 〉 Stressed Silicon Including Strain-Dependent Mass

  • Author

    Dhar, Siddhartha ; Ungersböck, Enzo ; Kosina, Hans ; Grasser, Tibor ; Selberherr, Siegfried

  • Author_Institution
    Inst. fur Microelectron., Technische Univ. Wien
  • Volume
    6
  • Issue
    1
  • fYear
    2007
  • Firstpage
    97
  • Lastpage
    100
  • Abstract
    Stress-induced enhancement of electron mobility has primarily been attributed to the splitting of the conduction band minima. However, experiments have indicated that the mobility enhancement cannot solely be attributed to this effect, and a recent study has shown that stress along the lang110rang direction leads to a change of the effective mass. This work investigates the effect of the variation of the effective mass with stress along the lang110rang direction on the electron mobility. An improved low-field mobility model incorporating the effective mass change is presented
  • Keywords
    conduction bands; effective mass; electron mobility; elemental semiconductors; piezoelectricity; silicon; Si; conduction band; effective mass; electron mobility model; strain-dependent mass; stress-induced mobility enhancement; stressed silicon; Capacitive sensors; Charge carrier processes; Effective mass; Electron mobility; Geometry; Monte Carlo methods; Occupational stress; Silicon; Tensile stress; Uniaxial strain; Effective mass; low-field mobility; mobility model; uniaxial stress/strain;
  • fLanguage
    English
  • Journal_Title
    Nanotechnology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1536-125X
  • Type

    jour

  • DOI
    10.1109/TNANO.2006.888533
  • Filename
    4063326