• DocumentCode
    965953
  • Title

    Field emission from tungsten-clad silicon pyramids

  • Author

    Busta, Heinz H. ; Shadduck, Robert R. ; Orvis, William J.

  • Author_Institution
    Amoco Technol. Co., Naperville, IL, USA
  • Volume
    36
  • Issue
    11
  • fYear
    1989
  • fDate
    11/1/1989 12:00:00 AM
  • Firstpage
    2679
  • Lastpage
    2685
  • Abstract
    Arrays of silicon pyramids are fabricated on
  • Keywords
    chemical vapour deposition; electron field emission; elemental semiconductors; etching; silicon; tungsten; Fowler-Nordheim emission; LPCVD; Si; Si-W; W clad Si pyramids; WF6; anisotropic etching technique; field emission; hydrogen reduction method; integrated vacuum tubes; low-pressure chemical vapor deposition; silicon reduction method; vacuum microelectronics; Anisotropic magnetoresistance; Chemical vapor deposition; Current density; Etching; Fabrication; Hydrogen; Silicon; Sputtering; Testing; Tungsten;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.43772
  • Filename
    43772
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=965953