DocumentCode :
965953
Title :
Field emission from tungsten-clad silicon pyramids
Author :
Busta, Heinz H. ; Shadduck, Robert R. ; Orvis, William J.
Author_Institution :
Amoco Technol. Co., Naperville, IL, USA
Volume :
36
Issue :
11
fYear :
1989
fDate :
11/1/1989 12:00:00 AM
Firstpage :
2679
Lastpage :
2685
Abstract :
Arrays of silicon pyramids are fabricated on
Keywords :
chemical vapour deposition; electron field emission; elemental semiconductors; etching; silicon; tungsten; Fowler-Nordheim emission; LPCVD; Si; Si-W; W clad Si pyramids; WF6; anisotropic etching technique; field emission; hydrogen reduction method; integrated vacuum tubes; low-pressure chemical vapor deposition; silicon reduction method; vacuum microelectronics; Anisotropic magnetoresistance; Chemical vapor deposition; Current density; Etching; Fabrication; Hydrogen; Silicon; Sputtering; Testing; Tungsten;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.43772
Filename :
43772
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=965953
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