Title :
Microstructures for control of multiple ion or electron beams
Author :
Jones, Gary W. ; Jones, Susan K. ; Walters, Mark D. ; Dudley, Bruce W.
Author_Institution :
Microelectron. Center of North Carolina, Research Triangle Park, NC, USA
fDate :
11/1/1989 12:00:00 AM
Abstract :
Structures have been fabricated with the potential to provide multiple particle beam control for high-speed direct-write lithography with the potential of gigahertz date rates and 0.1- mu m pixel sizes. The principal device structure consists of an array of apertures capable of supporting individual deflectors that is built into monolithic single-crystal silicon substrate. The construction of versions of these structures with very small 0.08- mu m apertures and with aperture/Einsel lens combinations has been demonstrated. Far-submicrometer (<0.10 mu m) resist structures have been printed using wand apertures fabricated by oxidizing silicon orifices. The performance of such a prototype lithography system using wand lens arrays has been projected to have a 3.84-GHz effective data rate and under 1-min writing times of high-density patterns on 100-mm wafers. Key aspects of fabrication of the microstructure are described.
Keywords :
electron beam lithography; electron lenses; electron optics; electrostatic lenses; ion beam lithography; ion optics; 0.08 micron; Si orifice oxidation; aperture/Einsel lens combinations; direct-write lithography; electron beams; electrostatic deflectors; high-density patterns; ion beams; microstructure fabrication; multiple particle beam control; prototype lithography system; single crystal Si substrate; wand apertures; wand lens arrays; Apertures; Electron beams; Lenses; Lithography; Microstructure; Orifices; Particle beams; Resists; Silicon; Size control;
Journal_Title :
Electron Devices, IEEE Transactions on