DocumentCode
965980
Title
Theory of junction between two-dimensional electron gas and p-type semiconductor
Author
Gelmont, Boris ; Shur, Michael ; Moglesture, C.
Author_Institution
Dept. of Electr. Eng., Virginia Univ., Charlottesville, VA, USA
Volume
39
Issue
5
fYear
1992
fDate
5/1/1992 12:00:00 AM
Firstpage
1216
Lastpage
1222
Abstract
The authors develop a theory of the junction between a two-dimensional electron gas and a three-dimensional p-type semiconductor contact. The cut-in voltage of such a junction depends on the density of the 2-D electron gas. Hence, at low currents, the device current varies exponentially with the 2-D gas density. The unique features of such junctions include a very small effective cross section (equal to the product of the thickness of the 2-D gas and the device width) and, hence, a small junction capacitance and a small device current at large current densities. Using a conformal mapping technique, the authors calculate potential and field distributions and find the differential device capacitance as a function of bias. They then calculate the output device characteristics for different gate voltages. The results of a 2-D self-consistent Monte Carlo simulation for such a structure are presented. This simulation clearly shows that electrons and holes are localized in the vicinity of the 2-D electron gas even at high drain biases
Keywords
Monte Carlo methods; high electron mobility transistors; p-n heterojunctions; semiconductor device models; 2-D electron gas; 2-D self-consistent Monte Carlo simulation; HEMT; conformal mapping technique; cut-in voltage; device current; electron gas p-type semiconductor junctions; field distributions; gate voltages; high drain biases; large current densities; output device characteristics; p-type semiconductor contact; potential distribution; small device current; small effective cross section; small junction capacitance; Capacitance; Charge carrier processes; Conformal mapping; Current density; Electrodes; Electrons; HEMTs; MODFETs; P-n junctions; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.129106
Filename
129106
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