Title :
Tunable Optical Bandpass Filter With Variable-Aperture MEMS Reflector
Author :
Yu, Kyoungsik ; Lee, Daesung ; Park, Namkyoo ; Solgaard, Olav
Author_Institution :
Korea Electr. Eng. & Sci. Res. Inst., Seoul Nat. Univ.
Abstract :
We report on a tunable optical bandpass filter with precise and independent control of its optical bandwidth and center wavelength. The optical filter is based on a double-pass monochromator configuration and a variable-aperture microelectromechanical systems (MEMS) reflector with two blocking micromirrors that manipulate the optical passband. The MEMS reflector is fabricated on the sidewalls of (110) silicon-on-insulator material by a combination of wet etching and deep reactive ion etching. The 1-dB optical bandwidth is continuously tunable from 3.65 to 6.35 nm by changing the position of the blocking micromirrors with lateral combdrive actuators. The center wavelength can be accurately controlled within a 30-nm spectral range by rotating the diffraction grating and/or changing the center location of the variable aperture with the combdrive actuators. The measured group delay variation across the passband was negligible
Keywords :
band-pass filters; micromechanical devices; micromirrors; optical fabrication; optical filters; optical tuning; silicon-on-insulator; sputter etching; 3.65 to 6.35 nm; combdrive actuators; deep reactive ion etching; diffraction grating; double-pass monochromator; microelectromechanical systems; micromirrors; silicon-on-insulator material; tunable optical bandpass filter; variable-aperture MEMS reflector; wet etching; Band pass filters; Bandwidth; Micromechanical devices; Micromirrors; Optical control; Optical filters; Optical variables control; Particle beam optics; Passband; Wet etching; Bandpass filters; gratings; microelectromechanical devices; optical fiber communication; optical filters; tunable filters; wavelength division multiplexing;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2006.884987