DocumentCode :
967021
Title :
Vacuum Deposition Techniques in an Engineering Laboratory Facility for Producing Thin Film Integrated Circuits
Author :
Kraus, R.D.
Author_Institution :
Motorola Inc.
Volume :
7
Issue :
3
fYear :
1963
fDate :
7/1/1963 12:00:00 AM
Firstpage :
40
Lastpage :
47
Keywords :
Capacitors; Laboratories; Resistors; Sputtering; Substrates; Temperature control; Thickness control; Thin film circuits; Vacuum technology; Voltage-controlled oscillators;
fLanguage :
English
Journal_Title :
Product Engineering and Production, IEEE Transactions on
Publisher :
ieee
ISSN :
0097-4544
Type :
jour
DOI :
10.1109/TPEP.1963.1136403
Filename :
1136403
Link To Document :
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