DocumentCode

967021

Title

Vacuum Deposition Techniques in an Engineering Laboratory Facility for Producing Thin Film Integrated Circuits

Author

Kraus, R.D.

Author_Institution

Motorola Inc.

Volume

7

Issue

3

fYear

1963

fDate

7/1/1963 12:00:00 AM

Firstpage

40

Lastpage

47

Keywords

Capacitors; Laboratories; Resistors; Sputtering; Substrates; Temperature control; Thickness control; Thin film circuits; Vacuum technology; Voltage-controlled oscillators;

fLanguage

English

Journal_Title

Product Engineering and Production, IEEE Transactions on

Publisher

ieee

ISSN

0097-4544

Type

jour

DOI

10.1109/TPEP.1963.1136403

Filename

1136403