DocumentCode :
967384
Title :
Planar-doped barriers in GaAs by molecular beam epitaxy
Author :
Malik, R.J. ; Aucoin, T.R. ; Ross, R.L. ; Board, K. ; Wood, C.E.C. ; Eastman, L.F.
Author_Institution :
US Army Electronics Command, Electronics Technology & Devices Laboratory, Fort Monmouth, USA
Volume :
16
Issue :
22
fYear :
1980
Firstpage :
836
Lastpage :
838
Abstract :
A new majority carrier rectifying device is demonstrated which is made in gallium arsenide by molecular beam epitaxy. It exhibits thermionic transport with positive and negative bias and the barrier height and degree of asymmetry in the I/V characteristic can be continuously varied. The device also shows a constant capacitance with bias.
Keywords :
III-V semiconductors; gallium arsenide; molecular beam epitaxial growth; semiconductor diodes; GaAs; MBE; barrier height; constant capacitance; majority carrier rectifying device; molecular beam epitaxy; thermionic transport;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19800594
Filename :
4245366
Link To Document :
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