Title :
Scaling of Stark-shifted per-carrier nonlinearities in multiple-quantum-well device structures
Author :
Cartwright, Alexander N. ; Huang, X.R. ; Smirl, Arthur L.
Author_Institution :
Lab. for Photonics & Quantum Electron., Iowa Univ., Iowa City, IA, USA
fDate :
10/1/1995 12:00:00 AM
Abstract :
We demonstrate simple rules for the scaling of per-carrier Stark-shifted nonlinearities with well number, electric field, amplitude and width of the excitonic transition by measuring the per carrier nonlinear response of a number of multiple-quantum-well structures as a function of temperature, bias and materials system. These measurements illustrate that the per-carrier nonlinearity can be improved by optimizing the in-well bias field and by increasing the number of wells per intrinsic region; however, they also demonstrate that when the measured per-carrier nonlinearities are corrected for material quality and temperature (i.e., excitonic amplitude and linewidth) that the per-carrier response does not depend appreciably on material system or on whether the fields are externally-applied, built-in, or intrinsic
Keywords :
Stark effect; electro-optical effects; excitons; nonlinear optics; semiconductor quantum wells; spectral line breadth; Stark-shifted per-carrier nonlinearities; electric field; excitonic amplitude; excitonic transition; externally-applied; in-well bias field; intrinsic region; material system; multiple-quantum-well device structures; multiple-quantum-well structures; per carrier nonlinear response; per-carrier nonlinearities; per-carrier response; scaling; temperature; well number; Cities and towns; Electric variables measurement; Laboratories; Nonlinear optics; Optical devices; Optical materials; Optical refraction; Photonics; Quantum well devices; Temperature dependence;
Journal_Title :
Quantum Electronics, IEEE Journal of