• DocumentCode
    967577
  • Title

    Monte Carlo simulation of impact ionization rates in InAlAs-InGaAs square and graded barrier superlattice

  • Author

    Watanabe, Isao ; Torikai, Toshitaka ; Taguchi, Kenko

  • Author_Institution
    Opto-Electron. Res. Labs., NEC Corp., Tsukuba, Japan
  • Volume
    31
  • Issue
    10
  • fYear
    1995
  • fDate
    10/1/1995 12:00:00 AM
  • Firstpage
    1826
  • Lastpage
    1834
  • Abstract
    The Monte Carlo method is used to analyze impact ionization rates for electrons and holes in a ⟨100⟩ crystal direction In0.52Al0.48As-In0.53Ga0.47 As square and graded barrier superlattice. The calculated impact ionization rate ratio α/β is enhanced to more than 10 in a wide barrier and narrow-well square barrier superlattice. This is because the hole ionization rate β is greatly reduced in the narrower well superlattice, while the electron ionization rate α is less sensitive to well and barrier layer thickness. These results are explained by a combination of the ionization dead space effect for the barrier layer and the electron ionization rate enhancement in the well layer due to large conduction band edge discontinuity. Furthermore, it is found that in a graded barrier superlattice, the impact ionization rate ratio α/β is smaller than that for a square barrier superlattice having the same barrier and well thickness. This is due to the occurrence of hole ionization in the narrow bandgap region in graded barriers. The band structure effects on hot carrier energy distribution, as well as impact ionization, are also discussed
  • Keywords
    III-V semiconductors; Monte Carlo methods; aluminium compounds; avalanche photodiodes; conduction bands; gallium arsenide; hot carriers; impact ionisation; indium compounds; semiconductor superlattices; In0.52Al0.48As-In0.53Ga0.47 As; InAlAs-InGaAs; InAlAs-InGaAs graded barrier superlattice; InAlAs-InGaAs square barrier superlattice; Monte Carlo simulation; band structure effects; barrier layer thickness; electron ionization rate; graded barriers; hole ionization rate; hot carrier energy distribution; impact ionization rates; ionization dead space effect; large conduction band edge discontinuity; narrow bandgap region; narrow-well; superlattice APD; well layer thickness; wide barrier; Charge carrier processes; Conducting materials; Hot carriers; Impact ionization; Indium phosphide; Laboratories; National electric code; Optical noise; Signal to noise ratio; Superlattices;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/3.466058
  • Filename
    466058