DocumentCode
968410
Title
Surface-charge properties of fluorine-doped lead borosilicate glass
Author
Shimbo, Masashi ; Furukawa, Kazuki ; Tanzawa, Katsujiro ; Higuchi, Toyoki
Author_Institution
Toshiba Corp., Kawasaki, Japan
Volume
35
Issue
1
fYear
1988
fDate
1/1/1988 12:00:00 AM
Firstpage
124
Lastpage
128
Abstract
Surface-charge configurations, together with stability under bias-temperature (BT) stress, for F-doped and Na-doped lead borosilicate glass were investigated by using C -V and I - V measurements on metal-glass-silicon capacitors and on diodes passivated with the glass. The C -V characteristics showed an increase in negative charge for F doping and in positive charge for Na doping. Alkali impurities in the glass mainly controlled the surface-charge shift during BT, but additional changes, similar to those for Na doping but reversing the sign of the charge, took place by F doping. The leakage current decrease in the diode passivated with F-doped glass, which contradicts the results of C -V measurement, may be due to the education of the generation current by the interaction between the silicon surface and F- ions
Keywords
aluminosilicate glasses; borosilicate glasses; fluorine; lead compounds; leakage currents; metal-insulator-semiconductor structures; passivation; semiconductor diodes; semiconductor technology; sodium; static electrification; Al-B2O3-SiO2-Si:P; Al-BSG-Si:P; C-V characteristics; I-V characteristics; SiO2-PbO-B2O3-Al2O 3:Na,F; bias temperature stress; borosilicate glass; diodes; generation current; leakage current; metal-glass-silicon capacitors; negative charge; passivation; positive charge; stability; surface charge configurations; surface-charge shift; Capacitors; Current measurement; Diodes; Doping; Glass; Impurities; Leakage current; Silicon; Stability; Stress measurement;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.2427
Filename
2427
Link To Document