• DocumentCode
    968755
  • Title

    Submicron resolution deep UV photolithography

  • Author

    Voshchenkov, A.M. ; Herrmann, Harald

  • Author_Institution
    Bell Telephone Laboratories, Holmdel, USA
  • Volume
    17
  • Issue
    2
  • fYear
    1981
  • Firstpage
    61
  • Lastpage
    62
  • Abstract
    A vacuum contact printing technique was used to evaluate the resolution limits of deep UV photolithography with a 300±30 nm exposure band. For the first time, an array of 200 chip sites containing 0.5 ¿m meander patterns 3 cm long was clearly resolved in AZ 2415 positive resist across 2 in diameter silicon wafers.
  • Keywords
    integrated circuit technology; photolithography; silicon; AZ 2415 positive resist; Si wafers; chip sites; deep UV photolithography; meander patterns; resolution limits; vacuum contact printing technique;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19810044
  • Filename
    4245505
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=968755